Electron Optical Lithography - an overview | ScienceDirect Topics
Electron Beam Lithography | Materials Research Institute
High speed e-beam writing for large area photonic nanostructures — a choice of parameters | Scientific Reports
Comparison of e-beam lithography (EBL) versus direct-write EBL. In EBL,... | Download Scientific Diagram
9: Process using electron beam lithography for writing the patterns and... | Download Scientific Diagram
Multiple-electron-beam direct-write comes of age
Template fabrication scheme by combining electron beam lithography in... | Download Scientific Diagram
Lithography
Nanomaterials | Free Full-Text | Evolution in Lithography Techniques: Microlithography to Nanolithography
Schematic illustration of electron beam lithography. Electron beam is... | Download Scientific Diagram
Electron-beam lithography on M108Y and M35G chemically amplified DUV photoresists - ScienceDirect
Direct Patterning of Zinc Sulfide on a Sub-10 Nanometer Scale via Electron Beam Lithography | ACS Nano
All-water-based electron-beam lithography using silk as a resist | Nature Nanotechnology
Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept: Journal of Vacuum Science & Technology B: Vol 28, No 6
Electron-beam lithography for polymer bioMEMS with submicron features | Microsystems & Nanoengineering
Optimization of an electron beam lithography instrument for fast, large area writing at 10 kV acceleration voltage: Journal of Vacuum Science & Technology B: Vol 31, No 4
JEOL USA blog | An overview of electron beam lithography
Patterning at the Resolution Limit of Commercial Electron Beam Lithography | Nano Letters
A multiple-electron-beam exposure system for high-throughput, direct-write submicrometer lithography | Semantic Scholar
Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning
Electron-beam lithography - Wikipedia
Enhancing Materials for Hi-Res Patterning to Advance Microelectronics | BNL Newsroom
3D electron-beam writing at sub-15 nm resolution using spider silk as a resist | Nature Communications
Electron beam lithography (EBL) for fabrication of nano-hole arrays | Download Scientific Diagram
Development of massively parallel electron beam direct write lithography using active-matrix nanocrystalline-silicon electron emitter arrays | Microsystems & Nanoengineering
The electron beam lithography (EBL) process for biomimetic particles... | Download Scientific Diagram
